Photophysics Department - Research
1. Photophysics of nanomaterials
Among the physical deposition methods of preparation of thin layers (called physical vapour deposition - PVD) in our department we use a PLVD (pulsed laser vapour deposition) technique based on the use of ablation of the material under influence of pulsed laser beam. This technique is particularly useful for research purposes, because of possible selection and control of the experimental conditions and process parameters in a wide range. Selectable process parameters are: substrate temperature, base pressure, the intensity of the vapour stream (system geometry, the distance the substrate from vapour source, the rate of evaporation), the energy of the vapour stream (depending on the density of pulse energy, laser wavelength and pulse rate), the type of material used pair production (solid or powder/nanopowder pressed), and type and pressure of buffer gas.
2. Non-destructive analysis
3. High performance coatings
FLUID-FLOW MACHINERY
Polish Academy of Sciences
